An investigation of cascade energy density effects using classical trajectory simulations of sputtering by molecular ions.
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Authors
Mason, William A.
Subjects
sputtering
computer simulation
molecular ion
computer simulation
molecular ion
Advisors
Harrison, Don E. Jr.
Date of Issue
1983-06
Date
June 1983
Publisher
Monterey, California. Naval Postgraduate School
Language
en_US
Abstract
The NPS computer simulation model was modified to study
sputtering by molecular ions. The simulations were
performed on a Cu(111) surface for normally incident O⁺₂
ions at 0.5, 1.25, 2.5, and 5.0 kev/ion. The molecule's
angular orientation was both set at specific values and
randomly determined. The normalized energy distributions
of sputtered atoms for two energy ranges, 0-20 and 0-3
ev/sputtered atom, and the sputtering yield ratios were
investigated. The 0-20 ev/sputtered atom energy
distributions show distinct peaks at 1.8 ev which are
insensitive to incident energy, energy density, and
molecular orientation. Simulations indicate that there may
be fine structure in the 0-3 ev/sputtered atom range with a
cascade interaction unique to molecular sputtering. For a
number of molecular orientations which produce very
different cascade overlaps, the sputtering yield ratios do
not correlate with the degree of overlap. The energy
density of a cascade is not an accurate predictor of the
sputtering yield ratio.
Type
Thesis
Description
Series/Report No
Department
Physics
Organization
Naval Postgraduate School (U.S.)
Identifiers
NPS Report Number
Sponsors
Funding
Format
Citation
Distribution Statement
Approved for public release; distribution is unlimited.
Rights
This publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.