Transmission sputtering ratio in monocrystalline silver foils and associated reactor analysis of sputtered silver

Abstract

Thin monocrystalline films of 100 and 111 orientation were grown by epitaxy condensation on LiF substrates. Film thicknesses varied from 13,150 A to 17,520 A. Laue X-ray transmission patterns revealed the films to be 75 to 90$ monocrystalline in nature. Sputtering ratios in the thin films were obtained for a 50$ transmission point. Sputtering ratios for 100 and 111 orientations varied from 0.01 to 0.06. The sputtered silver was collected on carbon backings and irradiated in the AGN-201 reactor at 200 watts for four minutes. A computer analysis of the resulting decay curves yielded amounts of silver sputtered. The minimum acceptable reactor detection limit for silver was found to be 1 x 10"' grams.