Low temperature (LT) grown GaAs buffer layers for III-V semiconductor processes
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Authors
Weatherford, T.R.
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Advisors
Date of Issue
1999
Date
Publisher
IEEE
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Abstract
Low Temperature Grown (LTG) GaAs buffers have been shown to eliminate backgating, reduce subthreshold leakage, provide ultrashort carrier lifetimes [I], and radiation hardness [2]. However, undoped LTG buffers have shown poor reliability, poor RF performance [3], and inconsistent lot-to-lot properties. Recent p-doped LT GaAs buffers promise thermally stable material to withstand changes during annealing steps, plus improved performance over undoped LT GaAs buffers.
Type
Article
Description
The article of record as published may be found at http://dx.doi.org/10.1109/GAAS.1999.803724
21st Annual GaAs IC Symposium, 17-20 October 1999, pp. 47-50, Monterey, CA, USA
21st Annual GaAs IC Symposium, 17-20 October 1999, pp. 47-50, Monterey, CA, USA
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Department
Electrical and Computer Engineering
Organization
Naval Postgraduate School (U.S.)
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This publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.