Publication:
Benchmark study of run-to-run controllers for the lithographic control of the critical dimension

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Authors
Mao, Ziqiang (John)
Kang, Wei
Subjects
sensitivity
feedback control
exponentially weighted moving average
critical dimension control
stability
Kalman filter
Advisors
Date of Issue
2007
Date
Publisher
Language
Abstract
We present a systematic robustness analysis for several feedback controllers used in photolithographic critical dimension CD control in semiconductor manufacturing. Our study includes several controllers based on either the exponentially weighted moving average EWMA estimation or Kalman filters. The robustness is characterized by two features, namely the controller’s stability margin in the presence of model mismatch and the controller’s sensitivity to unknown noise. Simulations on the closed-loop control system are shown for the performance comparison. Both the analysis and the simulations prove that the multiple-dimensional feedback controller developed in this paper using the average of previous inputs and outputs outperforms the other controllers in the group.
Type
Article
Description
The article of record as published may be found at http://dx.doi.org/10.1117/1.2743657
Series/Report No
Department
Applied Mathematics
Organization
Naval Postgraduate School (U.S.)
Identifiers
NPS Report Number
Sponsors
Funder
Format
11 p.
Citation
Mao, J. & Kang, W. 2007, "Benchmark study of run-to-run controllers for the lithographic control of the critical dimension", Journal of Micro/Nanolithography, MEMS, and MOEMS, vol. 6, no. 2.
Distribution Statement
Rights
This publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.
This publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.
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