Sputtering from oblique ion incidence using computer simulation technique.
sputteringfromob00holc.pdf (2.738Mb)Abstract
A self-contained computer simulation of sputtering from 20
keV incident ions is not possible with present computers. However,
a simulation can be done by considering primary and secondary
collisions separately. An investigation of 20 keV argon ions
incident obliquely on the (100) surface of a face-centered cubic
copper crystal was done at angles from 29 to 6l degrees from
normal. Results strongly support the concept of transparency,
but indicate that focused collision sequences make very limited
contributions to sputtering. Depending on the ion beam incidence
angle, up to 25 percent of the sputtering may be due to random
collision cascades initiated by deep primary collisions. The
remainder is caused by surface collision mechanisms. Reflection
of incident ions off surface atoms significantly affects argon-copper
sputtering when the ions are obliquely incident.
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