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dc.contributor.advisorLindsey, G. H.
dc.contributor.authorEngle, Edward C.
dc.dateDecember 1979
dc.date.accessioned2012-11-16T19:30:35Z
dc.date.available2012-11-16T19:30:35Z
dc.date.issued1979-12
dc.identifier.urihttp://hdl.handle.net/10945/18772
dc.description.abstractThe advent of onboard aircraft microprocessor fatigue monitoring systems will establish the opportunity to fully exploit residual stresses at stress-critical areas, including their effects on fatigue predictions. An experimental investigation was undertaken to more fully understand them by making photoelastic measurements of residual stresses at notches in simulated wing panels of 7075-T6 aluminum and to establish the relationships between the local stresses, residual stresses, and the far-field or applied stress. The stress concentration factors were found to decrease with increased plastic deformation while the strain concentration factors were found to remain constant. The residual stress levels were found to be immutable despite changes in fatigue loading conditions, notch geometry, or test duration.en_US
dc.description.urihttp://archive.org/details/aninvestigationo1094518772
dc.language.isoen_US
dc.publisherMonterey, California. Naval Postgraduate Schoolen_US
dc.rightsThis publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.en_US
dc.subject.lcshAeronauticsen_US
dc.titleAn investigation of residual stresses in simulated wing panels of 7075-T6 aluminum.en_US
dc.typeThesisen_US
dc.contributor.corporateNaval Postgraduate School (U.S.)
dc.contributor.departmentAeronautics
dc.subject.authorresidual stressen_US
dc.subject.authorstress concentrationen_US
dc.subject.authorstrain concentrationen_US
dc.description.serviceLieutenant Commander, United States Navyen_US
etd.thesisdegree.nameM.S. in Aeronautical Engineeringen_US
etd.thesisdegree.levelMastersen_US
etd.thesisdegree.disciplineAeronautical Engineeringen_US
etd.thesisdegree.grantorNaval Postgraduate Schoolen_US
dc.description.distributionstatementApproved for public release; distribution is unlimited.


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