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dc.contributor.advisorCooper, A.W.
dc.contributor.authorGarcia, Edward Lee
dc.dateDecember 1984
dc.date.accessioned2012-11-19T23:50:57Z
dc.date.available2012-11-19T23:50:57Z
dc.date.issued1984-12
dc.identifier.urihttp://hdl.handle.net/10945/19481
dc.description.abstractThe Hydrogen Fluoride/Deuterium Fluoride Laser is a fast flow electrical discharge operated chemical laser. Refitting of the subsystems of the laser was completed and lasing was observed utilizing a 100 percent reflectance mirror and a 95 percent reflectance output coupling mirror. The maximum multiline output power obtained was 2.6 watts at 19.0 kV and 475 mA. The data obtained was in general agreement with previously reported data. However, an increase in power output from 1.6 to 2.6 watts was obtained by utilization of a Hipotronics power supply that enabled usage of higher input voltages for SF₆ dissociation. Measurements were also taken over a variation of the He, SF, H, and O flow rates resulting in the change of the optimum flow rates for the above listed gases. The new flows were found to be (1) SF₆ = .7167 grams/second (2) H₂ = .0220 grams/second (3) O₂ = .22 grams/second and (4) He = .05 grams/second. Target reflectivity/absorptivity measurements were taken and a dependence on incidence angle with the laser beam was found. For the P-doped Silicon wafer used, the power absorbed decreased over the range of 25 to 60 degrees. At the 25 degree angle approximately 95 percent of the incident power was absorbed. The reflected power was found to increase with the increase in target angle with approximately 95 percent of the incident power being reflected at 60 degrees. The results of these measurements are in general agreement with previously reported measurements. A design for reconfiguring the HF/DF laser system into a pulsed system was also formulated but was not tested. The design criterion was to utilize a capacitor bank to drop a high voltage pulse across the anodes of the laser.
dc.description.urihttp://archive.org/details/operatingcharact1094519481
dc.language.isoen_US
dc.rightsThis publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.
dc.subject.lcshPhysicsen_US
dc.titleOperating characteristics, absorptivity/reflectivity measurements, and pulse system design of the NPS Hydrogen Fluoride/Deuterium Fluoride Laser.en_US
dc.typeThesisen_US
dc.contributor.secondreaderMilne, Edmund A.
dc.contributor.corporateNaval Postgraduate School (U.S.)
dc.contributor.departmentPhysics
dc.subject.authorhydrogen fluoride/deuterium fluoride laseren_US
dc.subject.authorabsorptivity/reflectivityen_US
dc.description.serviceLieutenant, United States Navy
etd.thesisdegree.nameM.S. in Physicsen_US
etd.thesisdegree.levelMastersen_US
etd.thesisdegree.disciplinePhysicsen_US
etd.thesisdegree.grantorNaval Postgraduate Schoolen_US
dc.description.distributionstatementApproved for public release; distribution is unlimited.


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