An investigation of cascade energy density effects using classical trajectory simulations of sputtering by molecular ions.

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Author
Mason, William A.
Date
1983-06Advisor
Harrison, Don E. Jr.
Second Reader
Dyer, J.
Metadata
Show full item recordAbstract
The NPS computer simulation model was modified to study
sputtering by molecular ions. The simulations were
performed on a Cu(111) surface for normally incident O⁺₂
ions at 0.5, 1.25, 2.5, and 5.0 kev/ion. The molecule's
angular orientation was both set at specific values and
randomly determined. The normalized energy distributions
of sputtered atoms for two energy ranges, 0-20 and 0-3
ev/sputtered atom, and the sputtering yield ratios were
investigated. The 0-20 ev/sputtered atom energy
distributions show distinct peaks at 1.8 ev which are
insensitive to incident energy, energy density, and
molecular orientation. Simulations indicate that there may
be fine structure in the 0-3 ev/sputtered atom range with a
cascade interaction unique to molecular sputtering. For a
number of molecular orientations which produce very
different cascade overlaps, the sputtering yield ratios do
not correlate with the degree of overlap. The energy
density of a cascade is not an accurate predictor of the
sputtering yield ratio.
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