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An investigation of cascade energy density effects using classical trajectory simulations of sputtering by molecular ions.

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Author
Mason, William A.
Date
1983-06
Advisor
Harrison, Don E. Jr.
Second Reader
Dyer, J.
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Abstract
The NPS computer simulation model was modified to study sputtering by molecular ions. The simulations were performed on a Cu(111) surface for normally incident O⁺₂ ions at 0.5, 1.25, 2.5, and 5.0 kev/ion. The molecule's angular orientation was both set at specific values and randomly determined. The normalized energy distributions of sputtered atoms for two energy ranges, 0-20 and 0-3 ev/sputtered atom, and the sputtering yield ratios were investigated. The 0-20 ev/sputtered atom energy distributions show distinct peaks at 1.8 ev which are insensitive to incident energy, energy density, and molecular orientation. Simulations indicate that there may be fine structure in the 0-3 ev/sputtered atom range with a cascade interaction unique to molecular sputtering. For a number of molecular orientations which produce very different cascade overlaps, the sputtering yield ratios do not correlate with the degree of overlap. The energy density of a cascade is not an accurate predictor of the sputtering yield ratio.
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This publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.
URI
http://hdl.handle.net/10945/19857
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  • 1. Thesis and Dissertation Collection, all items

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    Molecular dynamics simulation study of the influence of the ion mass upon atom ejection processes 

    Harrison, D.E. Jr. (American Institute of Physics, 1981-06-01);
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