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dc.contributor.advisorOlsen, Richard Christopher
dc.contributor.authorPark, Young-chul
dc.date.accessioned2013-01-23T21:55:19Z
dc.date.available2013-01-23T21:55:19Z
dc.date.issued1989
dc.identifier.urihttps://hdl.handle.net/10945/25974
dc.description.urihttp://archive.org/details/hollowcathodepla1094525974
dc.format.extent54 p.en_US
dc.language.isoen_US
dc.publisherMonterey, California. Naval Postgraduate Schoolen_US
dc.titleHollow cathode plasma source characteristics.en_US
dc.typeThesisen_US
dc.contributor.corporateNA
dc.contributor.schoolNA
dc.contributor.departmentPhysics
dc.description.recognitionNAen_US
dc.identifier.oclcocm81338977
etd.thesisdegree.nameM.S. in Physicsen_US
etd.thesisdegree.levelMastersen_US
etd.thesisdegree.disciplinePhysicsen_US
etd.thesisdegree.grantorNaval Postgraduate Schoolen_US


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