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dc.contributor.authorHeaton, Marck C.
dc.date1990
dc.date.accessioned2013-02-15T23:10:38Z
dc.date.available2013-02-15T23:10:38Z
dc.date.issued1990-12
dc.identifier.urihttp://hdl.handle.net/10945/27597
dc.descriptionApproved for public release; distribution unlimited.en_US
dc.description.abstractThis paper investigates the scattering from impedance strips and impedance-loaded conducting strips. The UTd diffraction coefficient for an edge in a conductor is heuristically modified for impedance edges and junctions. Essentially, this is done by scaling the UTD diffraction coefficients according to changes in the geometrical optics field. The new diffraction coefficients are then used to investigate the scattering from impedance strips and impedance- loaded conducting strips. Both uniform and tapered impedances are considered. Results are compared to moment method and physical optics predictions and to measured data. The scattering pattern of a uniform impedance strip was seen to behave as that for a conducting strip, but at a lower level. However, tapering the impedance was seen to significantly decrease the sidelobe levels relative to the main lobe. Also, applying an impedance load to a conducting strip reduced the sidelobe levels. This was most pronounced for loads of tapered impedance. the modified UTD approach accurately predicted the sidelobe levels and locations for the simple impedance strips, and worked fairly well for the impedance-loaded conducting strips. The predictions for all geometries were better near broadside incidence than near edge-on.en_US
dc.languageen_US
dc.rightsApproved for public release; distribution unlimited.en_US
dc.rightsThis publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. As such, it is in the public domain, and under the provisions of Title 17, United States Code, Section 105, may not be copyrighted.en_US
dc.titleElectromagnetic Scattering from Impedance Strips and Impedance-Loaded Conducting Strips.en_US
dc.typeThesisen_US
dc.contributor.corporateNaval Postgraduate School (U.S.)
dc.description.recognitionNAen_US
dc.identifier.oclcocn639929905


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