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dc.contributor.authorFuhs, Allen E
dc.contributor.authorBlaisdell, Gregory A
dc.contributor.authorEtchechury, James
dc.contributor.authorCole, Lonnie
dc.date1980-09
dc.date.accessioned2013-03-07T21:54:44Z
dc.date.available2013-03-07T21:54:44Z
dc.date.issued1980-09
dc.identifier.urihttp://hdl.handle.net/10945/30259
dc.descriptionThis Report was presented at the 1980 Annual Meeting of the Optical Society of America, Chicago, IL, 14-17 October 1980.en_US
dc.description.abstractTransient refractive index was calculated for an e-beam pumped XeF laser having initial concentrations Ne:Xe:NF3en_US
dc.description.sponsorshipPrepared for: Defense Advanced Research Projects Agencyen_US
dc.description.urihttp://archive.org/details/transientrefract00fuhs
dc.language.isoen_US
dc.publisherMonterey, California. Naval Postgraduate Schoolen_US
dc.rightsApproved for public release; distribution unlimited.en_US
dc.subject.lcshUNITED STATES NAVY--OFFICERS--PERSONNEL MANAGEMENT--MATHEMATICAL MODELSen_US
dc.titleTransient refractive index in a XeF laseren_US
dc.typeTechnical Reporten_US
dc.contributor.corporateNaval Postgraduate School (U.S.)
dc.contributor.departmentAeronautics
dc.subject.authorLaser, Excimer Laser, Refractive Index, Beam Quality, Oscillator Strength, Photoionizationen_US
dc.identifier.npsreportNPS67-80-012


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