Infrared imaging using arrays of SiO2 micromechanical detectors
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In this Letter, we describe the fabrication of an array of bimaterial detectors for infrared (IR) imaging that utilize SiO2 as a structural material. All the substrate material underneath the active area of each detector element was removed. Each detector element incorporates an optical resonant cavity layer in the IR-absorbing region of the sensing element. The simplified microfabrication process requires only four photolithographic steps with no wet etching or sacrificial layers...
Optics Letters, Volume 37, No. 19, pp. 3966-3968 (October 2012)