Optical comb sources and high-resolution optical filtering for measurement of photodiode harmonic distortion
Loading...
Authors
McKinney, Jason D.
Leiard, Daniel E.
Hastings, Alex S.
Weiner, Andrew M.
Williams, Keith J.
Subjects
Harmonic distortion
Microwave photonics
Optical combs
Photodiodes
Microwave photonics
Optical combs
Photodiodes
Advisors
Date of Issue
2010-04-15
Date
Publisher
IEEE
Language
Abstract
In this work we preset a new technique for measurement of harmonic distortion in microwave photodiodes. Our techniques combines optical combs and high-resolution optical filtering to provide a pure optical-two-tone excitation of the photodiode. Our technique removes the challenges presented by laser frequency drift and modulator bias control by utilizing a single laser and phase-modulation to synthesize the optical combs. We demonstrate our technique through measurement of the harmonic distortion generated in a commercial InGaAs photodiode and compare our results with those obtained via phase-locked laser measurements. We show that this technique provides essentially equivalent measurement fidelity to phase-locked laser techniques while offering decreased system complexity. We additionally provide a general discussion of the limits of nonlinearity measurement performed using optical heterodyne techniques.
Type
Article
Description
The article of record as published may be found at http://dx.doi.org/10.1109/JLT.2010.2044632
Series/Report No
Department
Photonics Technology Laboratory
Organization
Purdue University
Identifiers
NPS Report Number
Sponsors
The work at Purdue University was supported in part by the Naval Postgraduate School under grant N00244-09-2-0068 under the National Security Science and Engineering Faculty Fellowship Program
Funder
Grant N00244-09-2-0068
Format
7 p.
Citation
McKinney, et al, Journal of Lightwave Technology, v. 28, no.8 April 15, 2010
Distribution Statement
Rights
This publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.