Computer Simulation of Sputtering
Harrison, D.E. Jr.
Johnson, J.P. III
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The article of record as published may be found at http://dx.doi.org/10.1063/1.1656850
RightsThis publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.
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Holcombe, Horace Truman (Monterey, California ; Naval Postgraduate School, 1970);A self-contained computer simulation of sputtering from 20 keV incident ions is not possible with present computers. However, a simulation can be done by considering primary and secondary collisions separately. An ...
Harrison, Don E. Jr.; Moore, W.L. Jr.; Holcombe, H.T (1973);The conclusions of the first paper in this series have been confirmed by simulations in which the copper target is represented by a composite potential function consisting of a Born-Mayer repulsive potential segment, a ...
Johnson, John Palmer, III (1966);Sputtering of monocrystalline copper, a face-centered cubic, was investigated by computer simulation techniques using the Born-Mayer potential . Normally incident argon ions were shot into the (111), (110), and (100) ...