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dc.contributor.authorGrbovic, Dragoslav
dc.contributor.authorAlves, Fabio
dc.contributor.authorKearney, Brian
dc.contributor.authorKaramitros, Apostolos
dc.contributor.authorKarunasiri, Gamani
dc.date.accessioned2018-10-18T23:26:36Z
dc.date.available2018-10-18T23:26:36Z
dc.date.issued2011
dc.identifier.citationGrbovic, Dragoslav, et al. "Optimization of THz absorption in thin films." Sensors, 2011 IEEE. IEEE, 2011.
dc.identifier.urihttp://hdl.handle.net/10945/60328
dc.description.abstractIn this paper, we report on experimentally verified models, which assist in the design and fabrication of either thin metal films, with high broad-band absorption in the 3-5 THz spectral region, or thin metatamaterial structures of nearly 100% absorption at a specific, resonant, THz frequency. The THz absorption properties of the structures were modeled using COMSOL finite element modeling software. Optimized thin metal films and thin metamaterial structures were fabricated using standard microfabrication processes on Si substrates. The THz spectral characteristics of the structures were probed using FTIR spectrometer in the reflection mode. The measured THz reflection, from thin film of both broad-band and resonant metamaterial structures, exhibit excellent agreement with their respective models. Both types of absorbers can be incorporated in the fabrication of MEMS-based THz thermal sensors operating in active mode with quantum cascade laser (QCL) sources.en_US
dc.description.sponsorshipOffice of Naval Research (ONR)
dc.description.sponsorshipOffice of Basic Energy Sciences, U.S. Department of Energy.
dc.format.extent4 p.
dc.publisherIEEEen_US
dc.rightsThis publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.en_US
dc.titleOptimization of THz Absorption in Thin Filmsen_US
dc.typeArticleen_US
dc.contributor.corporateNaval Postgraduate School (U.S.)en_US
dc.contributor.departmentPhysicsen_US


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