Show simple item record

dc.contributor.authorTaylor, R.J.
dc.contributor.authorBunshah, R.F.
dc.contributor.authorSchwirzke, F.
dc.date1980
dc.date.accessioned2019-08-12T16:10:25Z
dc.date.available2019-08-12T16:10:25Z
dc.date.issued1980
dc.identifier.citationTaylor, R. J., R. F. Bunshah, and F. Schwirzke. "Impurity control of tokamaks with in situ metal deposition." Journal of Nuclear Materials 93 (1980): 338-342.en_US
dc.identifier.urihttp://hdl.handle.net/10945/62868
dc.descriptionThe article of record as published may be found at http://dx.doi.org/10.1016/0022-3115(80)90345-1en_US
dc.description.abstractMetal coatings of titanium and chromium of different thickness were deposited in situ in microtor and macrotor tokamaks and tested for impurity control. To improve the microstructure of the metal deposit, Ti and Cr were evaporated at a slow rate of about 20 Å/h during discharge cleaning. A 200 Å fresh metal deposition is required to obtain oxygen free surface layers. The oxygen control by Cr deposits was comparable to the one with Ti coatings. The hydrogen recycling rate increased markedly for Cr deposits. Control measurements show that the problem of hydrogen and deuterium retention in the metal coating during a switchover from one gas to the other can be overcome by short time outgassing to 650 K.en_US
dc.description.sponsorshipUS Department of Energy
dc.format.extent5 p.en_US
dc.publisherNorth-Holland Publishing Companyen_US
dc.rightsThis publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.en_US
dc.titleImpurity control of tokamaks with in situ metal depositionen_US
dc.typeArticle
dc.contributor.corporateNaval Postgraduate School (U.S.)en_US
dc.contributor.departmentPhysics and Chemistyen_US
dc.description.funderGrant No. DE-AM03-76SF00010


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record