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dc.contributor.advisorBiblarz, Oscar
dc.contributor.authorBrown, George Scott
dc.dateDecember 1991
dc.date.accessioned2014-11-20T21:36:02Z
dc.date.available2014-11-20T21:36:02Z
dc.date.issued1991-12
dc.identifier.urihttps://hdl.handle.net/10945/43771
dc.description.abstractAnode sheaths impact the operation of many practical plasma devices. This complex region is explored in detail for collisional, isothermal (identical specie temperatures), low-temperature plasmas, where sheath dimensions are in the micron range. The selected approach involves postulation of a specific electric field distribution with two shape factors. Previous research regarding planar anodes is verified and expanded upon using greater parameter ranges. 'z', a dimensionless quantity specifying plasma composition and condition, groups diverse plasmas into 'families' exhibiting similar sheath characteristics. 'n', a nondimensional ratio of electrical energy to thermal energy in the sheath, allows temperature effects to be studies. The investigation focuses on three disparate families that span a z range of 1.1729 to 2.1493, at n values defines by plasma temperatures of 6000(o) K, 3000(o) K, and 300(o) K. Results indicate that at lower temperatures, charge production in the outer sheath is generic to the electric field distribution, and that the sheaths themselves are nearly unaffected by substantial changes in temperature (i.e., n). Conversely, sheath density and extent are shown to vary significantly for differing z values. Newly derived equations governing cylindrical anodes generate sheaths that are virtually identical to corresponding planar cases. It is shown only those anodes whose radii are comparable to the plasma's 'characteristic radius' (y) must be treated with the cylindrical formulation; non-vacuous plasmas would require micron-width anodes to be thus affected. Finally, an analytical approach yields solutions that confirm the numerical results, and offers an algebraic approximation for high-n plasmas.en_US
dc.description.urihttp://archive.org/details/exploringplasmsh1094543771
dc.format.extent93 p.en_US
dc.language.isoen_US
dc.publisherMonterey, California. Naval Postgraduate Schoolen_US
dc.rightsThis publication is a work of the U.S. Government as defined in Title 17, United States Code, Section 101. Copyright protection is not available for this work in the United States.en_US
dc.titleExploring plasma sheath solutions for planar and cylindrical anodesen_US
dc.typeThesisen_US
dc.contributor.secondreaderCollins, D. J.
dc.contributor.corporateNaval Postgraduate School (U.S.)
dc.contributor.departmentDepartment of Aeronautical and Astronautical Engineering
dc.subject.authorPlasmaen_US
dc.subject.authorPlasma sheathsen_US
dc.subject.authorAnode sheathsen_US
dc.subject.authorCylindrical anodesen_US
dc.description.serviceLieutenant Commander, United States Navyen_US
etd.thesisdegree.nameM.S. in Aeronautical Engineeringen_US
etd.thesisdegree.levelMastersen_US
etd.thesisdegree.disciplineAeronautical Engineeringen_US
etd.thesisdegree.grantorNaval Postgraduate Schoolen_US
dc.description.distributionstatementApproved for public release; distribution is unlimited.


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